Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heating
نویسندگان
چکیده
There is a need for developing synthesis techniques that allow the growth of high-quality functional films at low substrate temperatures to minimize energy consumption and enable coating temperature-sensitive substrates. A typical shortcoming conventional low-temperature strategies insufficient atomic mobility, which leads porous microstructures with impurity incorporation due atmosphere exposure, and, in turn, poor mechanical properties. Here, we report dense Ti0.67Hf0.33B1.7 thin hardness ~41.0 GPa grown without external heating (substrate temperature below ~100 °C) by hybrid high-power impulse dc magnetron co-sputtering (HfB2-HiPIMS/TiB2-DCMS) pure Ar on Al2O3(0001) bias potential −300 V synchronized target-ion-rich portion each HiPIMS pulse. The limited mobility inherent such desired deposition compensated heavy-mass ion (Hf+) irradiation promoting Ti0.67Hf0.33B1.7.
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ژورنال
عنوان ژورنال: Vacuum
سال: 2021
ISSN: ['0042-207X', '1879-2715']
DOI: https://doi.org/10.1016/j.vacuum.2021.110057